Generalized method to design phase masks for 3D super-resolution microscopy

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dc.citation.firstpage3799en_US
dc.citation.issueNumber3en_US
dc.citation.journalTitleOptics Expressen_US
dc.citation.lastpage3816en_US
dc.citation.volumeNumber27en_US
dc.contributor.authorWang, Wenxiaoen_US
dc.contributor.authorYe, Fanen_US
dc.contributor.authorShen, Haoen_US
dc.contributor.authorMoringo, Nicholas A.en_US
dc.contributor.authorDutta, Chayanen_US
dc.contributor.authorRobinson, Jacob T.en_US
dc.contributor.authorLandes, Christy F.en_US
dc.date.accessioned2019-12-12T17:25:34Zen_US
dc.date.available2019-12-12T17:25:34Zen_US
dc.date.issued2019en_US
dc.description.abstractPoint spread function (PSF) engineering by phase modulation is a novel approach to three-dimensional (3D) super-resolution microscopy, with different point spread functions being proposed for specific applications. It is often not easy to achieve the desired shape of engineered point spread functions because it is challenging to determine the correct phase mask. Additionally, a phase mask can either encode 3D space information or additional time information, but not both simultaneously. A robust algorithm for recovering a phase mask to generate arbitrary point spread functions is needed. In this work, a generalized phase mask design method is introduced by performing an optimization. A stochastic gradient descent algorithm and a Gauss-Newton algorithm are developed and compared for their ability to recover the phase masks for previously reported point spread functions. The new Gauss-Newton algorithm converges to a minimum at much higher speeds. This algorithm is used to design a novel stretching-lobe phase mask to encode temporal and 3D spatial information simultaneously. The stretching-lobe phase mask and other masks are fabricated in-house for proof-of-concept using multi-level light lithography and an optimized commercially sourced stretching-lobe phase mask (PM) is validated experimentally to encode 3D spatial and temporal information. The algorithms’ generalizability is further demonstrated by generating a phase mask that comprises four different letters at different depths.en_US
dc.identifier.citationWang, Wenxiao, Ye, Fan, Shen, Hao, et al.. "Generalized method to design phase masks for 3D super-resolution microscopy." <i>Optics Express,</i> 27, no. 3 (2019) Optical Society of America: 3799-3816. https://doi.org/10.1364/OE.27.003799.en_US
dc.identifier.digitaloe-27-3-3799en_US
dc.identifier.doihttps://doi.org/10.1364/OE.27.003799en_US
dc.identifier.urihttps://hdl.handle.net/1911/107881en_US
dc.language.isoengen_US
dc.publisherOptical Society of Americaen_US
dc.rights© 2019 Optical Society of America under the terms of the OSA Open Access Publishing Agreementen_US
dc.rights.urihttps://www.osapublishing.org/library/license_v1.cfm#VOR-OAen_US
dc.titleGeneralized method to design phase masks for 3D super-resolution microscopyen_US
dc.typeJournal articleen_US
dc.type.dcmiTexten_US
dc.type.publicationpublisher versionen_US
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