Photobleaching Lifetimes of Cyanine Fluorophores Used for Single Molecule Förster Resonance Energy Transfer in the Presence of Various Photoprotection Systems

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dc.citation.firstpage1075en_US
dc.citation.issueNumber9en_US
dc.citation.journalTitleChemBioChemen_US
dc.citation.lastpage1080en_US
dc.citation.volumeNumber14en_US
dc.contributor.authorCooper, Daviden_US
dc.contributor.authorUhm, Heuien_US
dc.contributor.authorTauzin, Lawrence J.en_US
dc.contributor.authorPoddar, Niteshen_US
dc.contributor.authorLandes, Christy F.en_US
dc.date.accessioned2014-10-06T17:18:01Zen_US
dc.date.available2014-10-06T17:18:01Zen_US
dc.date.issued2013en_US
dc.description.abstractWe investigated various photoprotection system combinations to find the combination that optimally extended the photobleach lifetime of a Cy3/Cy5 smFRET pair attached to a DNA hairpin in a single-molecule environment. We found that the glucose/glucose oxygen-scavenging solution in combination with redox-based photostabilization solutions yielded the longest average photobleaching lifetimesen_US
dc.identifier.citationCooper, David, Uhm, Heui, Tauzin, Lawrence J., et al.. "Photobleaching Lifetimes of Cyanine Fluorophores Used for Single Molecule Förster Resonance Energy Transfer in the Presence of Various Photoprotection Systems." <i>ChemBioChem,</i> 14, no. 9 (2013) John Wiley & Sons, Inc.: 1075-1080. http://dx.doi.org/10.1002/cbic.201300030.en_US
dc.identifier.doihttp://dx.doi.org/10.1002/cbic.201300030en_US
dc.identifier.urihttps://hdl.handle.net/1911/77399en_US
dc.language.isoengen_US
dc.publisherJohn Wiley & Sons, Inc.en_US
dc.rightsThis is an author's peer-reviewed final manuscript, as accepted by the publisher. The published article is copyrightedby John Wiley & Sons Ltd.en_US
dc.subject.keywordDNAen_US
dc.subject.keywordfluorophoreen_US
dc.subject.keywordFRETen_US
dc.subject.keywordphotobleachen_US
dc.subject.keywordsingle-molecule studiesen_US
dc.titlePhotobleaching Lifetimes of Cyanine Fluorophores Used for Single Molecule Förster Resonance Energy Transfer in the Presence of Various Photoprotection Systemsen_US
dc.typeJournal articleen_US
dc.type.dcmiTexten_US
dc.type.publicationpost-printen_US
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