Automatic parameter selection for electron ptychography via Bayesian optimization

dc.citation.articleNumber12284en_US
dc.citation.journalTitleScientific Reportsen_US
dc.citation.volumeNumber12en_US
dc.contributor.authorCao, Michael C.en_US
dc.contributor.authorChen, Zhenen_US
dc.contributor.authorJiang, Yien_US
dc.contributor.authorHan, Yimoen_US
dc.date.accessioned2022-08-04T14:53:30Zen_US
dc.date.available2022-08-04T14:53:30Zen_US
dc.date.issued2022en_US
dc.description.abstractElectron ptychography provides new opportunities to resolve atomic structures with deep sub-angstrom spatial resolution and to study electron-beam sensitive materials with high dose efficiency. In practice, obtaining accurate ptychography images requires simultaneously optimizing multiple parameters that are often selected based on trial-and-error, resulting in low-throughput experiments and preventing wider adoption. Here, we develop an automatic parameter selection framework to circumvent this problem using Bayesian optimization with Gaussian processes. With minimal prior knowledge, the workflow efficiently produces ptychographic reconstructions that are superior to those processed by experienced experts. The method also facilitates better experimental designs by exploring optimized experimental parameters from simulated data.en_US
dc.identifier.citationCao, Michael C., Chen, Zhen, Jiang, Yi, et al.. "Automatic parameter selection for electron ptychography via Bayesian optimization." <i>Scientific Reports,</i> 12, (2022) Springer Nature: https://doi.org/10.1038/s41598-022-16041-5.en_US
dc.identifier.digitals41598-022-16041-5en_US
dc.identifier.doihttps://doi.org/10.1038/s41598-022-16041-5en_US
dc.identifier.urihttps://hdl.handle.net/1911/112989en_US
dc.language.isoengen_US
dc.publisherSpringer Natureen_US
dc.rightsThis article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article's Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article's Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder.en_US
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/en_US
dc.titleAutomatic parameter selection for electron ptychography via Bayesian optimizationen_US
dc.typeJournal articleen_US
dc.type.dcmiTexten_US
dc.type.publicationpublisher versionen_US
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