Minimizing residues and strain in 2D materials transferred from PDMS

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dc.citation.articleNumber265203en_US
dc.citation.journalTitleNanotechnologyen_US
dc.citation.volumeNumber29en_US
dc.contributor.authorJain, Achinten_US
dc.contributor.authorBharadwaj, Palashen_US
dc.contributor.authorHeeg, Sebastianen_US
dc.contributor.authorParzefall, Markusen_US
dc.contributor.authorTaniguchi, Takashien_US
dc.contributor.authorWatanabe, Kenjien_US
dc.contributor.authorNovotny, Lukasen_US
dc.date.accessioned2018-09-26T14:52:37Zen_US
dc.date.available2018-09-26T14:52:37Zen_US
dc.date.issued2018en_US
dc.description.abstractIntegrating layered two-dimensional (2D) materials into 3D heterostructures offers opportunities for novel material functionalities and applications in electronics and photonics. In order to build the highest quality heterostructures, it is crucial to preserve the cleanliness and morphology of 2D material surfaces that come in contact with polymers such as PDMS during transfer. Here we report that substantial residues and up to ∼0.22% compressive strain can be present in monolayer MoS2 transferred using PDMS. We show that a UV-ozone pre-cleaning of the PDMS surface before exfoliation significantly reduces organic residues on transferred MoS2 flakes. An additional 200 ◦C vacuum anneal after transfer efficiently removes interfacial bubbles and wrinkles as well as accumulated strain, thereby restoring the surface morphology of transferred flakes to their native state. Our recipe is important for building clean heterostructures of 2D materials and increasing the reproducibility and reliability of devices based on them.en_US
dc.identifier.citationJain, Achint, Bharadwaj, Palash, Heeg, Sebastian, et al.. "Minimizing residues and strain in 2D materials transferred from PDMS." <i>Nanotechnology,</i> 29, (2018) IOP Publishing: https://doi.org/10.1088/1361-6528/aabd90.en_US
dc.identifier.digitalJain-2018en_US
dc.identifier.doihttps://doi.org/10.1088/1361-6528/aabd90en_US
dc.identifier.urihttps://hdl.handle.net/1911/102700en_US
dc.language.isoengen_US
dc.publisherIOP Publishingen_US
dc.rightsOriginal content from this work may be used under the terms of the Creative Commons Attribution 3.0 licence. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI.en_US
dc.rights.urihttps://creativecommons.org/licenses/by/3.0/en_US
dc.titleMinimizing residues and strain in 2D materials transferred from PDMSen_US
dc.typeJournal articleen_US
dc.type.dcmiTexten_US
dc.type.publicationpublisher versionen_US
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