Fabrication of graphene nanoribbons and nanowires using a meniscus as an etch mask

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dc.contributor.assigneeRice Universityen_US
dc.contributor.publisherUnited States Patent and Trademark Officeen_US
dc.creatorTour, James M.en_US
dc.creatorAbramova, Veraen_US
dc.creatorSlesarev, Alexanderen_US
dc.date.accessioned2016-07-15T15:02:35Zen_US
dc.date.available2016-07-15T15:02:35Zen_US
dc.date.filed2014-02-03en_US
dc.date.issued2016-05-31en_US
dc.description.abstractIn some embodiments, the present disclosure pertains to methods of preparing graphene nanoribbons from a graphene film associated with a meniscus, where the method comprises patterning the graphene film while the meniscus acts as a mask above a region of the graphene film, and where the patterning results in formation of graphene nanoribbons from the meniscus-masked region of the graphene film. Additional embodiments of the present disclosure pertain to methods of preparing wires from a film associated with a meniscus, where the method comprises patterning the film while the meniscus acts as a mask above a region of the film, and where the patterning results in formation of a wire from the meniscus-masked region of the film. Additional embodiments of the present disclosure pertain to chemical methods of preparing wires from water-reactive materials.en_US
dc.digitization.specificationsThis patent information was downloaded from the US Patent and Trademark website (http://www.uspto.gov/) as image-PDFs. The PDFs were OCRed for access purposesen_US
dc.format.extent56en_US
dc.identifier.citationTour, James M., Abramova, Vera and Slesarev, Alexander, "Fabrication of graphene nanoribbons and nanowires using a meniscus as an etch mask." Patent US9356151B2. issued 2016-05-31. Retrieved from <a href="https://hdl.handle.net/1911/90920">https://hdl.handle.net/1911/90920</a>.en_US
dc.identifier.patentIDUS9356151B2en_US
dc.identifier.urihttps://hdl.handle.net/1911/90920en_US
dc.language.isoengen_US
dc.titleFabrication of graphene nanoribbons and nanowires using a meniscus as an etch masken_US
dc.typeUtility patenten_US
dc.type.dcmiTexten_US
dc.type.genrepatentsen_US
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