Direct gas fluorination of boron nitrides and compositions including fluorinated boron nitrides

dc.contributor.assigneeRice Universityen_US
dc.contributor.assigneeBaker Hughes Oilfield Operations LLCen_US
dc.contributor.publisherUnited States Patent and Trademark Officeen_US
dc.creatorKhabashesku, Valery N.en_US
dc.creatorMeiyazhagan, Ashok Kumaren_US
dc.creatorAjayan, Pulickel M.en_US
dc.date.accessioned2024-03-04T18:23:00Zen_US
dc.date.available2024-03-04T18:23:00Zen_US
dc.date.filed2019-12-19en_US
dc.date.issued2024-02-13en_US
dc.description.abstractA method for producing fluorinated boron nitride involves heating a reactor chamber, providing boron nitride in the reactor chamber, flowing fluorine and an inert gas through the reactor chamber, and exposing the boron nitride to the flowing gases and the heat. The method may include boron nitride that is exfoliated or non-exfoliated. The fluorinated boron nitride that is produced from this method may have a hexagonal crystal structure or a cubic crystal structure. The method may additionally comprise removing the fluorinated boron nitride from the reactor chamber and mixing it with a surfactant. A suspension may comprise particles of fluorinated boron nitride suspended in a fluid, which may be polar or non-polar, and may additionally include a surfactant. The fluorinated boron nitride may have a hexagonal or a cubic crystal structure. Furthermore, the boron nitride may be exfoliated or non-exfoliated.en_US
dc.digitization.specificationsThis patent information was downloaded from the US Patent and Trademark website (http://www.uspto.gov/) as image-PDFs. The PDFs were OCRed for access purposes.en_US
dc.format.extent13en_US
dc.identifier.patentIDUS11897767B2en_US
dc.identifier.urihttps://hdl.handle.net/1911/115463en_US
dc.language.isoengen_US
dc.titleDirect gas fluorination of boron nitrides and compositions including fluorinated boron nitridesen_US
dc.typeUtility patenten_US
dc.type.dcmiTexten_US
dc.type.genrepatentsen_US
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