An Integrated CAD Framework Linking VLSI Layout Editors and Process Simulators

dc.citation.bibtexNamemastersthesisen_US
dc.citation.firstpage102en_US
dc.citation.journalTitleMasters Thesisen_US
dc.contributor.orgCenter for Multimedia Communications (http://cmc.rice.edu/)en_US
dc.creatorSengupta, Chaitalien_US
dc.date.accessioned2007-10-31T01:05:35Zen_US
dc.date.available2007-10-31T01:05:35Zen_US
dc.date.issued1995-05-20en_US
dc.date.modified2003-07-12en_US
dc.date.submitted2001-08-23en_US
dc.descriptionMasters Thesisen_US
dc.description.abstractThis thesis presents an Integrated CAD Framework which links VLSI layout editors to lithographic simulators and provides information on the simulated resolution of a feature to the circuit designer. This will help designers to design more compact circuits, as they will be able to see the effect on manufactured silicon. The Framework identifies areas in a layout (in Magic or CIF format) that are more prone to problemsmask for a particular set of process parameters. The designer can modify the original layout based arising out of the photolithographic process. It then creates the corresponding in-puts for closer analysis with a process simulator (Depict) and analyzes the simulator outputs to decide whether the printed layout will match the designed upon this analysis. The Framework has been used to evaluate layouts for various process techniques. These evaluations illustrate the use of the Framework in determining the limits of any lithographic process.en_US
dc.description.sponsorshipNational Science Foundationen_US
dc.identifier.citation "An Integrated CAD Framework Linking VLSI Layout Editors and Process Simulators," <i>Masters Thesis,</i> 1995.en_US
dc.identifier.urihttps://hdl.handle.net/1911/20362en_US
dc.language.isoengen_US
dc.subjectIntegrated CAD Frameworken_US
dc.subjectVLSI editorsen_US
dc.subjectprocess simulatorsen_US
dc.subject.keywordIntegrated CAD Frameworken_US
dc.subject.keywordVLSI editorsen_US
dc.subject.keywordprocess simulatorsen_US
dc.titleAn Integrated CAD Framework Linking VLSI Layout Editors and Process Simulatorsen_US
dc.typeThesisen_US
dc.type.dcmiTexten_US
thesis.degree.levelMastersen_US
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