Ultrathin AAO Membrane as a Generic Template for Sub-100 nm Nanostructure Fabrication

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dc.citation.journalTitleChemistry of Materialsen_US
dc.contributor.authorRobatjazi, Hosseinen_US
dc.contributor.authorBahauddin, Shah Mohammaden_US
dc.contributor.authorMacfarlan, Luke H.en_US
dc.contributor.authorFu, Sidanen_US
dc.contributor.authorThomann, Isabellen_US
dc.contributor.orgLaboratory for Nanophotonicsen_US
dc.contributor.orgRice Quantum Instituteen_US
dc.contributor.orgRice Center for Quantum Materialsen_US
dc.date.accessioned2016-07-06T19:28:53Zen_US
dc.date.available2016-07-06T19:28:53Zen_US
dc.date.issued2016en_US
dc.description.abstractAnodic aluminum oxide (AAO) templates are emerging as a platform for simple, cost-effective, high-throughput top-down nanofabrication of regular arrays of nanostructures. Thus far, however, AAO pattern transfer has largely been restricted to smooth and chemically inert surfaces, mostly Silicon substrates. Here, we present a more generalizable strategy for preparing free-standing through-hole ultrathin alumina membranes (UTAMs) and transferring them to both smooth and rough substrates, thereby enabling the fabrication of centimeter-scale arrays of nanostructures with sub-100 nm feature diameters on almost arbitrary substrates. To validate the utility of our procedures, we transferred UTAMs to surfaces relevant for photocatalytic applications and prepared plasmonic photocathodes consisting of dense arrays of size-controlled sub-100 nm Au and Ni nanodots on top of chemically noninert NiOx thin films. To demonstrate the functionality of the fabricated structures, we used a plasmonic photocathode consisting of an array of sub-50 nm Au nanodots on NiOx/Al substrates to drive direct, plasmon-enhanced photoelectrocatalysis and found excellent device performance. We also successfully decorated very rough fluorine-doped tin oxide substrates with an array of high-density sub-100 nm nanodots. Our results extend the opportunities for AAO masks to serve as generic templates for novel applications that were previously prohibited by lack of methods to transfer to the required substrate.en_US
dc.identifier.citationRobatjazi, Hossein, Bahauddin, Shah Mohammad, Macfarlan, Luke H., et al.. "Ultrathin AAO Membrane as a Generic Template for Sub-100 nm Nanostructure Fabrication." <i>Chemistry of Materials,</i> (2016) American Chemical Society: http://dx.doi.org/10.1021/acs.chemmater.6b00722.en_US
dc.identifier.doihttp://dx.doi.org/10.1021/acs.chemmater.6b00722en_US
dc.identifier.urihttps://hdl.handle.net/1911/90806en_US
dc.language.isoengen_US
dc.publisherAmerican Chemical Societyen_US
dc.rightsThis is an author's peer-reviewed final manuscript, as accepted by the publisher. The published article is copyrighted by the American Chemical Society.en_US
dc.titleUltrathin AAO Membrane as a Generic Template for Sub-100 nm Nanostructure Fabricationen_US
dc.typeJournal articleen_US
dc.type.dcmiTexten_US
dc.type.publicationpost-printen_US
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