Browsing by Author "Wilson, William L. Jr."

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    Automated Evaluation of Critical Features in VLSI Layouts Based on Photolithographic Simulations
    (SME Press, 1996-01-01) Cavallaro, Joseph R.; Sengupta, Chaitali; Tittel, Frank K.; Wilson, William L. Jr.; Center for Multimedia Communication
    This paper describes a CAD tool (An Integrated CAD Framework) which links VLSI layout editors to lithographic simulators and provides information on the simulated resolution of a feature to the circuit designer. The designer can modify the original layout based upon this analysis to create compact circuits with better yield capabilities. The objective of this project is to improve the manufacturability of high density VLSI integrated circuits.
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    Submicron Optical Lithography Based on Interferometric Phase Shifting
    (SME Press, 1995-01-01) Cavallaro, Joseph R.; Tittel, Frank K.; Wilson, William L. Jr.; Center for Multimedia Communication
    One of the most critical processing steps in the fabrication of integrated circuits is microlithography. The design of high density DRAMs requires the accurate patterning of submicron structures. The manufacturability of VLSI components can be greatly improved through the integration of computer aided design and simulation software with an advanced interferometric optical system. In a new approach, a typical line and space pattern with features as fine as 0.3 um has been produced using a mask that has both transmitting areas and reflective areas and 355 nm laser illumination.