Browsing by Author "Talapatra, S."

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    Hall and field-effect mobilities in few layeredﾠp-WSe2ﾠfield-effect transistors
    (Macmillan Publishers Limited, 2015) Pradhan, N.R.; Rhodes, D.; Memaran, S.; Poumirol, J.M.; Smirnov, D.; Talapatra, S.; Feng, S.; Perea-Lopez, N.; Elias, A.L.; Terrones, M.; Ajayan, P.M.; Balicas, L.
    Here, we present a temperature (T) dependent comparison between field-effect and Hall mobilities in field-effect transistors based on few-layered WSe2 exfoliated onto SiO2. Without dielectric engineering and beyond a T-dependent threshold gate-voltage, we observe maximum hole mobilities approaching 350 cm(2)/Vs at T = 300 K. The hole Hall mobility reaches a maximum value of 650 cm(2)/Vs as T is lowered below ~150 K, indicating that insofar WSe2-based field-effect transistors (FETs) display the largest Hall mobilities among the transition metal dichalcogenides. The gate capacitance, as extracted from the Hall-effect, reveals the presence of spurious charges in the channel, while the two-terminal sheet resistivity displays two-dimensional variable-range hopping behavior, indicating carrier localization induced by disorder at the interface between WSe2 and SiO2. We argue that improvements in the fabrication protocols as, for example, the use of a substrate free of dangling bonds are likely to produce WSe2-based FETs displaying higher room temperature mobilities, i.e. approaching those of p-doped Si, which would make it a suitable candidate for high performance opto-electronics.
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    Intrinsic carrier mobility of multi-layered MoS2 field-effect transistors on SiO2
    (American Institute of Physics, 2013) Pradhan, N.R.; Rhodes, D.; Zhang, Q.; Talapatra, S.; Terrones, M.; Ajayan, P.M.; Balicas, L.
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    On-chip integrated vertically aligned carbon nanotube based super- and pseudocapacitors
    (Springer Nature, 2017) Pitkänen, O.; Järvinen, T.; Cheng, H.; Lorite, G.S.; Dombovari, A.; Rieppo, L.; Talapatra, S.; Duong, H.M.; Tóth, G.; Juhász, K.L.; Kónya, Z.; Kukovecz, A.; Ajayan, P.M.; Vajtai, R.; Kordás, K.
    On-chip energy storage and management will have transformative impacts in developing advanced electronic platforms with built-in energy needs for operation of integrated circuits driving a microprocessor. Though success in growing stand-alone energy storage elements such as electrochemical capacitors (super and pseusocapacitors) on a variety of substrates is a promising step towards this direction. In this work, on-chip energy storage is demonstrated using architectures of highly aligned vertical carbon nanotubes (CNTs) acting as supercapacitors, capable of providing large device capacitances. The efficiency of these structures is further increased by incorporating electrochemically active nanoparticles such as MnOx to form pseudocapacitive architectures thus enhancing device capacitance areal specific capacitance of 37 mF/cm2. The demonstrated on-chip integration is up and down-scalable, compatible with standard CMOS processes, and offers lightweight energy storage what is vital for portable and autonomous device operation with numerous advantages as compared to electronics built from discrete components.
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    Universal ac conduction in large area atomic layers of CVD-grown MoS2
    (American Physical Society, 2014) Ghosh, S.; Najmaei, S.; Kar, S.; Vajtai, R.; Lou, J.; Pradhan, N.R.; Balicas, L.; Ajayan, P.M.; Talapatra, S.
    Here, we report on the ac conductivity [σ’(ω); 10 mHz < ω < 0.1 MHz] measurements performed on atomically thin, two-dimensional layers of MoS2 grown by chemical vapor deposition (CVD). Σ’(ω) is observed to display a “universal” power law, i.e., σ’(ω) ∼ ωs measured within a broad range of temperatures, 10 K< T <340 K. The temperature dependence of ‘‘s” indicates that the dominant ac transport conduction mechanism in CVD-grown MoS2 is due to electron hopping through a quantum mechanical tunneling process. The ac conductivity also displays scaling behavior, which leads to the collapse of the ac conductivity curves obtained at various temperatures into a single master curve. These findings establish a basis for our understanding of the transport mechanism in atomically thin, CVD-grown MoS2 layers.