Anisotropy control of Ni-Fe films

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dc.contributor.advisorBourne, Henryen_US
dc.creatorWu, Hei-Hauen_US
dc.date.accessioned2016-04-22T21:58:04Zen_US
dc.date.available2016-04-22T21:58:04Zen_US
dc.date.issued1966en_US
dc.description.abstractThis paper presents a technique to control the anisotropy of nickel-iron films by appropriate masking during deposition. Because of the demagnetizing effect, the resulting anisotropy is increased if ridges representing thickness variations are formed along the easy axis and is decreased if ridges are perpendicular to the easy axis. Low-anisotropy films may be applicable in thin film memories because of small driving fields and fast responses. A theoretical model is postulated to explain this effect. Some numerical calculations and experimental data confirm the predicted phenomenon.en_US
dc.format.digitalOriginreformatted digitalen_US
dc.format.extent29 ppen_US
dc.identifier.callnoThesis E.E. 1966 WUen_US
dc.identifier.citationWu, Hei-Hau. "Anisotropy control of Ni-Fe films." (1966) Master’s Thesis, Rice University. <a href="https://hdl.handle.net/1911/89663">https://hdl.handle.net/1911/89663</a>.en_US
dc.identifier.digitalRICE0694en_US
dc.identifier.urihttps://hdl.handle.net/1911/89663en_US
dc.language.isoengen_US
dc.rightsCopyright is held by the author, unless otherwise indicated. Permission to reuse, publish, or reproduce the work beyond the bounds of fair use or other exemptions to copyright law must be obtained from the copyright holder.en_US
dc.titleAnisotropy control of Ni-Fe filmsen_US
dc.typeThesisen_US
dc.type.materialTexten_US
thesis.degree.departmentElectrical Engineeringen_US
thesis.degree.disciplineEngineeringen_US
thesis.degree.grantorRice Universityen_US
thesis.degree.levelMastersen_US
thesis.degree.nameMaster of Scienceen_US
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