Generation of diffraction-free beams for applications in optical microlithography

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dc.citation.firstpage287
dc.citation.issueNumber2en_US
dc.citation.journalTitleJournal of Vacuum Science and Technology Ben_US
dc.citation.lastpage292
dc.citation.volumeNumber15en_US
dc.contributor.authorErdelyi, Miklos
dc.contributor.authorHorvath, Zoltan L.
dc.contributor.authorSzabo, Gabor
dc.contributor.authorBor, Zs.
dc.contributor.authorTittel, Frank K.
dc.contributor.authorCavallaro, Joseph R.
dc.contributor.authorSmayling, Michael C.
dc.contributor.orgCenter for Multimedia Communicationen_US
dc.date.accessioned2012-06-05T16:31:10Z
dc.date.available2012-06-05T16:31:10Z
dc.date.issued1997-03-01eng
dc.description.abstractA new concept based on a Fabry–Perot interferometer for the generation of nondiffracting Bessel beams is described and proposed for potential applications in microlithography such as the fabrication of small isolated patterns. It was experimentally demonstrated that the depth of focus can be increased by a factor of about 2, and simultaneously the transverse resolution improved by a factor of 1.6, when using this technique to image contact holes. The properties of simultaneous imaging of two contact holes were also investigated. It was shown experimentally that, even in the most critical case ~when the first diffraction rings overlap!, undesirable interference effects between the adjacent contact holes can be eliminated by means of a phase shifting technique.en_US
dc.description.sponsorshipTexas Instrumentsen_US
dc.description.sponsorshipNational Science Foundationen_US
dc.description.sponsorshipOTKA Foundation of the Hungarian Academy of Sciencesen_US
dc.identifier.citationM. Erdelyi, Z. L. Horvath, G. Szabo, Z. Bor, F. K. Tittel, J. R. Cavallaro and M. C. Smayling, "Generation of diffraction-free beams for applications in optical microlithography," <i>Journal of Vacuum Science and Technology B,</i> vol. 15, no. 2, 1997.*
dc.identifier.doihttp://dx.doi.org/10.1116/1.589280en_US
dc.identifier.otherhttp://scholar.google.com/scholar?cluster=16114465869925515462&hl=en&as_sdt=0,44
dc.identifier.urihttps://hdl.handle.net/1911/64221
dc.language.isoengen
dc.publisherAmerican Vacuum Societyen_US
dc.subjectMicrolithographyen_US
dc.subjectFabry-Peroten_US
dc.subjectTransverse resolutionen_US
dc.subjectInterferenceen_US
dc.titleGeneration of diffraction-free beams for applications in optical microlithographyen_US
dc.typeJournal articleen_US
dc.type.dcmiTexten
dc.type.dcmiTexten_US
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