Generation of diffraction-free beams for applications in optical microlithography

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dc.citation.firstpage287en_US
dc.citation.issueNumber2en_US
dc.citation.journalTitleJournal of Vacuum Science and Technology Ben_US
dc.citation.lastpage292en_US
dc.citation.volumeNumber15en_US
dc.contributor.authorErdelyi, Miklosen_US
dc.contributor.authorHorvath, Zoltan L.en_US
dc.contributor.authorSzabo, Gaboren_US
dc.contributor.authorBor, Zs.en_US
dc.contributor.authorTittel, Frank K.en_US
dc.contributor.authorCavallaro, Joseph R.en_US
dc.contributor.authorSmayling, Michael C.en_US
dc.contributor.orgCenter for Multimedia Communicationen_US
dc.date.accessioned2012-06-05T16:31:10Zen_US
dc.date.available2012-06-05T16:31:10Zen_US
dc.date.issued1997-03-01en_US
dc.description.abstractA new concept based on a Fabry–Perot interferometer for the generation of nondiffracting Bessel beams is described and proposed for potential applications in microlithography such as the fabrication of small isolated patterns. It was experimentally demonstrated that the depth of focus can be increased by a factor of about 2, and simultaneously the transverse resolution improved by a factor of 1.6, when using this technique to image contact holes. The properties of simultaneous imaging of two contact holes were also investigated. It was shown experimentally that, even in the most critical case ~when the first diffraction rings overlap!, undesirable interference effects between the adjacent contact holes can be eliminated by means of a phase shifting technique.en_US
dc.description.sponsorshipTexas Instrumentsen_US
dc.description.sponsorshipNational Science Foundationen_US
dc.description.sponsorshipOTKA Foundation of the Hungarian Academy of Sciencesen_US
dc.identifier.citationM. Erdelyi, Z. L. Horvath, G. Szabo, Z. Bor, F. K. Tittel, J. R. Cavallaro and M. C. Smayling, "Generation of diffraction-free beams for applications in optical microlithography," <i>Journal of Vacuum Science and Technology B,</i> vol. 15, no. 2, 1997.en_US
dc.identifier.doihttp://dx.doi.org/10.1116/1.589280en_US
dc.identifier.otherhttp://scholar.google.com/scholar?cluster=16114465869925515462&hl=en&as_sdt=0,44en_US
dc.identifier.urihttps://hdl.handle.net/1911/64221en_US
dc.language.isoengen_US
dc.publisherAmerican Vacuum Societyen_US
dc.subjectMicrolithographyen_US
dc.subjectFabry-Peroten_US
dc.subjectTransverse resolutionen_US
dc.subjectInterferenceen_US
dc.titleGeneration of diffraction-free beams for applications in optical microlithographyen_US
dc.typeJournal articleen_US
dc.type.dcmiTexten_US
dc.type.dcmiTexten_US
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