Submicron Optical Lithography Based on a New Interferometric Phase Shifting Technique

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dc.citation.firstpage4269
dc.citation.issueNumber8Aen_US
dc.citation.journalTitleJapanese Journal of Applied Physicsen_US
dc.citation.lastpage4273
dc.citation.volumeNumber34en_US
dc.contributor.authorKido, Motoi
dc.contributor.authorSzabo, Gabor
dc.contributor.authorCavallaro, Joseph R.
dc.contributor.authorWilson, William L.
dc.contributor.authorSmayling, Michael C.
dc.contributor.authorTittel, Frank K.
dc.contributor.orgCenter for Multimedia Communicationen_US
dc.date.accessioned2012-05-30T15:46:16Z
dc.date.available2012-05-30T15:46:16Z
dc.date.issued1995-08-01eng
dc.description.abstractThis paper reports the computer simulation and experimental demonstration of a new phase shifting technique based on interferometry that is especially suited for deep ultraviolet (UV) microlithography. Significant resolution and contrast enhancement can be achieved using a chrome binary mask. Image analysis based on charge coupled device (CCD) detection and patterns recorded in UV photoresist has been used to study the capabilities of this new approach. Lines with a feature size as fine as 0.3 µm have been demonstrated using 355 nm illumination.en_US
dc.description.sponsorshipNational Science Foundationen_US
dc.identifier.citationM. Kido, G. Szabo, J. R. Cavallaro, W. L. Wilson, M. C. Smayling and F. K. Tittel, "Submicron Optical Lithography Based on a New Interferometric Phase Shifting Technique," <i>Japanese Journal of Applied Physics,</i> vol. 34, no. 8A, 1995.*
dc.identifier.doihttp://dx.doi.org/10.1143/JJAP.34.4269en_US
dc.identifier.issn10.1143/JJAP.34.4269
dc.identifier.otherhttp://scholar.google.com/scholar?q=Submicron+Optical+Lithography+Based+on+a+New+Interferometric+Phase+Shifting+Technique&btnG=&hl=en&as_sdt=0%2C44
dc.identifier.urihttps://hdl.handle.net/1911/64192
dc.language.isoengen
dc.publisherJapanese Journal of Applied Physicsen_US
dc.subjectPhase shifting techniqueen_US
dc.subjectdeep-UV microlithographyen_US
dc.titleSubmicron Optical Lithography Based on a New Interferometric Phase Shifting Techniqueen_US
dc.typeJournal articleen_US
dc.type.dcmiTexten
dc.type.dcmiTexten_US
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