A New Phase Shifting Technique for Deep UV Excimer Laser Based Lithography

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dc.citation.conferenceDate1995en_US
dc.citation.conferenceNameSPIE Conference on Photonics Westen_US
dc.citation.firstpage195en_US
dc.citation.lastpage202en_US
dc.citation.locationSan Jose, CAen_US
dc.contributor.authorBor, Zsolten_US
dc.contributor.authorCavallaro, Joseph R.en_US
dc.contributor.authorErdelyi, Miklosen_US
dc.contributor.authorKido, Motoien_US
dc.contributor.authorSengupta, Chaitalien_US
dc.contributor.authorSmayling, Michaelen_US
dc.contributor.authorSzabo, Gaboren_US
dc.contributor.authorTittel, Franken_US
dc.contributor.authorWilson, Williamen_US
dc.contributor.orgCenter for Multimedia Communicationen_US
dc.date.accessioned2012-06-15T20:49:42Zen_US
dc.date.available2012-06-15T20:49:42Zen_US
dc.date.issued1995-02-01en_US
dc.description.abstractThis paper reports simulation and experimental details of a novel phase shifting technique based o laser interferometry. Phase shifting is one of the most promising techniques for the fabrication of high density DRAM's. In recent years many kinds of phase shifting methods have been proposed to extend the resolution limit and contrast of image patterns. These techniques however, have several problems that result from the phase shift elements on the mask, especially when applied to UV excimer laser illumination. A new technique will be described that is based on a one-layered reticle which is used as both a reflective and transmissive mask, irradiated from both the front and the back sides. A combination of both off-axis illumination, as well as phase shift are used in this method. Both the relative path length of the two beams as well as their amplitude can be manipulated in such a way that near 100% contrast can be achieved in the final image. Experimental as well as simulation data are used to demonstrate this new method.en_US
dc.description.sponsorshipNational Science Foundationen_US
dc.identifier.citationZ. Bor, J. R. Cavallaro, M. Erdelyi, M. Kido, C. Sengupta, M. Smayling, G. Szabo, F. Tittel and W. Wilson, "A New Phase Shifting Technique for Deep UV Excimer Laser Based Lithography," 1995.en_US
dc.identifier.doihttp://dx.doi.org/10.1117/12.206950en_US
dc.identifier.otherhttp://scholar.google.com/scholar?cluster=15457731409527098742&hl=en&as_sdt=0,44en_US
dc.identifier.urihttps://hdl.handle.net/1911/64276en_US
dc.language.isoengen_US
dc.publisherSPIEen_US
dc.subjectPhotolithographyen_US
dc.subjectPhase shifting techniqueen_US
dc.subjectExcimer laseren_US
dc.titleA New Phase Shifting Technique for Deep UV Excimer Laser Based Lithographyen_US
dc.typeConference paperen_US
dc.type.dcmiTexten_US
dc.type.dcmiTexten_US
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