Short wavelength laser systems for applications

dc.contributor.advisorYoung, James F.en_US
dc.creatorSharp, Tracy Elizabethen_US
dc.date.accessioned2009-06-03T23:59:07Zen_US
dc.date.available2009-06-03T23:59:07Zen_US
dc.date.issued1993en_US
dc.description.abstractVery short wavelength lasers have many potential scientific and technological applications. A practical extreme ultraviolet (XUV) laser system has been developed using the Xe Auger laser at 109 nm. This system is the first XUV laser system pumped by a standard, commercially available, Nd:YAG laser system at a high repetition rate. The Xe laser is pumped by the soft x-rays generated by a laser-produced plasma. A grazing incidence, traveling-wave pumping geometry is used to reduce the pump energy required to achieve saturated energy outputs. A total equivalent small signal gain of exp(25) has been achieved with a 20 cm long gain region. The maximum output energy of this system is about 1 $\mu$J. The extension of the laser-produced plasma pumping technique to extremely short wavelength lasers will require very high power, ultrafast laser pulses in order to produce sufficient upper state densities for gain within the short lifetime of the excited state. To this end, we have studied a new ultrashort laser pulse amplifier based on the broad bandwidth XeF(C $\to$ A) excimer transition that is capable of directly amplifying pulses as short as 10 fs duration and has high energy storage capability. Construction of a tunable, blue-green, subpicosecond source of laser pulses for injection into the XeF(C $\to$ A) excimer amplifier is described. Gain characteristics of the XeF(C $\to$ A) excimer amplifier were investigated for several pulse lengths. Saturation energy densities of 50 mJ/cm$\sp2$ and 80 mJ/cm$\sp2$ were measured for injected laser pulse durations of 250 fs and $\sim$100 ps, respectively. A gain bandwidth of 60 nm was observed. Using an optimized unstable resonator design, the laser amplifier produced 275 mJ pulses with a duration of 250 fs, and a 2.5 times diffraction limited beam quality, making the XeF(C $\to$ A) excimer amplifier the first compact laser system in the visible spectral region to reach peak powers of the terawatt level.en_US
dc.format.extent109 p.en_US
dc.format.mimetypeapplication/pdfen_US
dc.identifier.callnoTHESIS E.E. 1993 SHARPen_US
dc.identifier.citationSharp, Tracy Elizabeth. "Short wavelength laser systems for applications." (1993) Diss., Rice University. <a href="https://hdl.handle.net/1911/16666">https://hdl.handle.net/1911/16666</a>.en_US
dc.identifier.urihttps://hdl.handle.net/1911/16666en_US
dc.language.isoengen_US
dc.rightsCopyright is held by the author, unless otherwise indicated. Permission to reuse, publish, or reproduce the work beyond the bounds of fair use or other exemptions to copyright law must be obtained from the copyright holder.en_US
dc.subjectElectronicsen_US
dc.subjectElectrical engineeringen_US
dc.subjectOpticsen_US
dc.titleShort wavelength laser systems for applicationsen_US
dc.typeThesisen_US
dc.type.materialTexten_US
thesis.degree.departmentElectrical Engineeringen_US
thesis.degree.disciplineEngineeringen_US
thesis.degree.grantorRice Universityen_US
thesis.degree.levelDoctoralen_US
thesis.degree.nameDoctor of Philosophyen_US
Files
Original bundle
Now showing 1 - 1 of 1
Loading...
Thumbnail Image
Name:
9408664.PDF
Size:
3.13 MB
Format:
Adobe Portable Document Format