Measurement and control of deposition temperature of Gd-Co rf sputtered films

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dc.contributor.advisorWilson, William L.en_US
dc.creatorChen, Che-Tsungen_US
dc.date.accessioned2018-12-18T21:25:01Zen_US
dc.date.available2018-12-18T21:25:01Zen_US
dc.date.issued1977en_US
dc.description.abstractA vacuum evaporated Chromel-Constantan Thin Film Thermocouple (TPTC) is developed and used to measure the deposition temperature of rf sputtered amorphous gadolinium-cobalt films. Deposition temperature can be varied with the type and the amount of thermal backing which affixes the substrates to the substrate holder. By controlling the temperature of cooling water running through the substrate holder control of the deposition temperature can be achieved to some degree. Results indicate that under normal deposition conditions the temperature on the substrate surface is around 1 °C. Results also indicate that gallium has better heat conduction and less temperature scatter than silicone grease when the same deposition parameters are maintained. Magnetic properties such as saturation magnetization, stripe period, anisotropy constant, exchange stiffness, and wall energy are investigated near the thermocouple junction where the deposition temperature is definitely known. A few Gd-Co-Mo films are also prepared during this research work and their magnetic properties are illustrated.en_US
dc.format.digitalOriginreformatted digitalen_US
dc.format.extent82 ppen_US
dc.identifier.callnoTHESIS E.E. 1977 CHENen_US
dc.identifier.citationChen, Che-Tsung. "Measurement and control of deposition temperature of Gd-Co rf sputtered films." (1977) Master’s Thesis, Rice University. <a href="https://hdl.handle.net/1911/104534">https://hdl.handle.net/1911/104534</a>.en_US
dc.identifier.digitalRICE2169en_US
dc.identifier.urihttps://hdl.handle.net/1911/104534en_US
dc.language.isoengen_US
dc.rightsCopyright is held by the author, unless otherwise indicated. Permission to reuse, publish, or reproduce the work beyond the bounds of fair use or other exemptions to copyright law must be obtained from the copyright holder.en_US
dc.titleMeasurement and control of deposition temperature of Gd-Co rf sputtered filmsen_US
dc.typeThesisen_US
dc.type.materialTexten_US
thesis.degree.departmentElectrical Engineeringen_US
thesis.degree.disciplineEngineeringen_US
thesis.degree.grantorRice Universityen_US
thesis.degree.levelMastersen_US
thesis.degree.nameMaster of Scienceen_US
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