An integrated CAD framework linking VLSI layout editors and process simulators

dc.contributor.advisorCavallaro, Joseph R.en_US
dc.creatorSengupta, Chaitalien_US
dc.date.accessioned2009-06-04T00:24:27Zen_US
dc.date.available2009-06-04T00:24:27Zen_US
dc.date.issued1995en_US
dc.description.abstractThis thesis presents an Integrated CAD Framework which links VLSI layout editors to lithographic simulators and provides information on the simulated resolution of a feature to the circuit designer. This will help designers to design more compact circuits, as they will be able to see the effect on manufactured silicon. The Framework identifies areas in a layout (in Magic or CIF format) that are more prone to problems arising out of the photolithographic process. It then creates the corresponding inputs for closer analysis with a process simulator (Depict) and analyzes the simulator outputs to decide whether the printed layout will match the designed mask for a particular set of process parameters. The designer can modify the original layout based upon this analysis. The Framework has been used to evaluate layouts for various process techniques. These evaluations illustrate the use of the Framework in determining the limits of any lithographic process.en_US
dc.format.extent91 p.en_US
dc.format.mimetypeapplication/pdfen_US
dc.identifier.callnoTHESIS E.E. 1995 SENGUPTAen_US
dc.identifier.citationSengupta, Chaitali. "An integrated CAD framework linking VLSI layout editors and process simulators." (1995) Master’s Thesis, Rice University. <a href="https://hdl.handle.net/1911/13995">https://hdl.handle.net/1911/13995</a>.en_US
dc.identifier.urihttps://hdl.handle.net/1911/13995en_US
dc.language.isoengen_US
dc.rightsCopyright is held by the author, unless otherwise indicated. Permission to reuse, publish, or reproduce the work beyond the bounds of fair use or other exemptions to copyright law must be obtained from the copyright holder.en_US
dc.subjectElectronicsen_US
dc.subjectElectrical engineeringen_US
dc.subjectIndustrial engineeringen_US
dc.titleAn integrated CAD framework linking VLSI layout editors and process simulatorsen_US
dc.typeThesisen_US
dc.type.materialTexten_US
thesis.degree.departmentElectrical Engineeringen_US
thesis.degree.disciplineEngineeringen_US
thesis.degree.grantorRice Universityen_US
thesis.degree.levelMastersen_US
thesis.degree.nameMaster of Scienceen_US
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