Processing and characterization of lithium niobate thin films for ferroelectric nonvolatile memory applications

dc.contributor.advisorRabson, Thomas A.en_US
dc.creatorZhu, Jieen_US
dc.date.accessioned2009-06-04T06:23:31Zen_US
dc.date.available2009-06-04T06:23:31Zen_US
dc.date.issued2002en_US
dc.description.abstractBoth highly c-axis and randomly-oriented LiNbO3 thin films are grown on p-type Si (111) substrates by RF magnetron sputtering and metallo-organic decomposition (MOD), respectively. Ellipsometry, X-ray diffraction, AFM and SEM are used to analyze the structural quality of the deposited ferroelectric thin films, including thickness, crystallinity, stoichiometry and surface roughness. Metal-ferroelectric-semiconductor structures are fabricated and electrically characterized with polarization vs. electric field (P-E) and capacitance vs. voltage (C-V) measurements. Hysteresis curves based on polarization switching are observed, verifying the ferroelectricity of deposited LiNbO3 thin films. Comparison of different film growth mechanisms between these two deposition methods is made, and their effects on physical and electrical characteristics of the derived LiNbO3 thin films are discussed. RF magnetron sputtering is proved to be a more promising thin-film growth technique than MOD for ferroelectric nonvolatile memory applications.en_US
dc.format.extent68 p.en_US
dc.format.mimetypeapplication/pdfen_US
dc.identifier.callnoTHESIS E.E. 2002 ZHUen_US
dc.identifier.citationZhu, Jie. "Processing and characterization of lithium niobate thin films for ferroelectric nonvolatile memory applications." (2002) Master’s Thesis, Rice University. <a href="https://hdl.handle.net/1911/17566">https://hdl.handle.net/1911/17566</a>.en_US
dc.identifier.urihttps://hdl.handle.net/1911/17566en_US
dc.language.isoengen_US
dc.rightsCopyright is held by the author, unless otherwise indicated. Permission to reuse, publish, or reproduce the work beyond the bounds of fair use or other exemptions to copyright law must be obtained from the copyright holder.en_US
dc.subjectElectronicsen_US
dc.subjectElectrical engineeringen_US
dc.titleProcessing and characterization of lithium niobate thin films for ferroelectric nonvolatile memory applicationsen_US
dc.typeThesisen_US
dc.type.materialTexten_US
thesis.degree.departmentElectrical Engineeringen_US
thesis.degree.disciplineEngineeringen_US
thesis.degree.grantorRice Universityen_US
thesis.degree.levelMastersen_US
thesis.degree.nameMaster of Scienceen_US
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