Browsing by Author "Bor, Zs."

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    Generation of diffraction-free beams for applications in optical microlithography
    (American Vacuum Society, 1997-03-01) Erdelyi, Miklos; Horvath, Zoltan L.; Szabo, Gabor; Bor, Zs.; Tittel, Frank K.; Cavallaro, Joseph R.; Smayling, Michael C.; Center for Multimedia Communication
    A new concept based on a Fabry–Perot interferometer for the generation of nondiffracting Bessel beams is described and proposed for potential applications in microlithography such as the fabrication of small isolated patterns. It was experimentally demonstrated that the depth of focus can be increased by a factor of about 2, and simultaneously the transverse resolution improved by a factor of 1.6, when using this technique to image contact holes. The properties of simultaneous imaging of two contact holes were also investigated. It was shown experimentally that, even in the most critical case ~when the first diffraction rings overlap!, undesirable interference effects between the adjacent contact holes can be eliminated by means of a phase shifting technique.
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    Generation of nearly nondiffracting Bessel beams with a Fabry–Perot interferometer
    (Optical Society of America, 1997-11-01) Horvath, Zoltan L.; Erdelyi, Miklos; Szabo, Gabor; Bor, Zs.; Tittel, Frank K.; Cavallaro, Joseph R.; Center for Multimedia Communication
    A new concept for generating zero-order Bessel beams was studied theoretically. The spatial intensity distribution was calculated numerically using a wave optics model. Approximate analytical expressions were derived to describe the radial intensity distribution in planes perpendicular to the optical axis of an imaging lens.