Rabson, Thomas A.2009-06-042009-06-041990Baumann, Robert Christopher. "Deposition, characterization, and applications of thin film lithium niobate." (1990) Diss., Rice University. <a href="https://hdl.handle.net/1911/16318">https://hdl.handle.net/1911/16318</a>.https://hdl.handle.net/1911/16318Ferroelectric thin films of lithium niobate have been epitaxially grown on a variety of silicon and gallium arsenide substrates by reactive r.f. sputtering. The deposition process was optimized by independently varying the substrate temperature, oxygen-argon ratio, target mixture, substrate type, and deposition times. The results of these tests are presented. The lithium niobate thin films were structurally analyzed using Bragg x-ray diffraction (XRD) and scanning electron microscopic (SEM) techniques to determine their orientation, grain size, and domain structure. Electrical characterization included C-V measurements utilized to calculate the permittivity, I-V to obtain the resistivity, and photocurrent measurements to verify the existence of a bulk photovoltaic and pyroelectric effect in the thin films. In addition, preliminary results on prefabricated devices are presented as well as a review of the pertinent effects and potential device applications based on thin films of lithium niobate.175 p.application/pdfengCopyright is held by the author, unless otherwise indicated. Permission to reuse, publish, or reproduce the work beyond the bounds of fair use or other exemptions to copyright law must be obtained from the copyright holder.ElectronicsElectrical engineeringCondensed matter physicsThesisThesis E.E. 1990 Baumann