Kido, MotoiCavallaro, Joseph R.Szabo, GaborWilson, William L.Tittel, Frank K.2012-06-212012-06-211994-01-01M. Kido, J. R. Cavallaro, G. Szabo, W. L. Wilson and F. K. Tittel, "A New Phase Shifting Method for High Resolution Microlithography," 1994.https://hdl.handle.net/1911/64286One of the most promising lithographic technique for the future designs of DRAMs is the phase-shifting mask technique. Conventional phase shifting-masks, however, are difficult to fabricate as they require regions of different optical thickness. We present a new phase shifting technique that does not use any phase shifting materials. A special interferometer and a mask that has both transmitting areas and reflective areas accomplish the required phase-shift at the image plane. Using this technique we have demonstrated phase shifting effects using a CCD camera. We also present the results of a computer simulation for the critical resolution of this new method in comparison with the conventional phase shifting approach.engPhase shifting techniqueDRAMsLithographicCritical resolutionTransmittingConference paperhttp://dx.doi.org/10.1117/12.175474