Wisoff, P. Jeffrey2009-06-042009-06-041991Phillips, Harvey Monroe. "Characterization of plasmas from a pulsed jet discharge with applications to VUV spectroscopy and micromechanics." (1991) Master’s Thesis, Rice University. <a href="https://hdl.handle.net/1911/13564">https://hdl.handle.net/1911/13564</a>.https://hdl.handle.net/1911/13564Plasmas from a pulsed jet discharge have been characterized with respect to gas species and nozzle design. Spectral lines from the gas used in the pulsed jet are apparent in the visible region. The vacuum ultraviolet spectrum, in particular for gases with high Z, is dominated by emission from species sputtered from the nozzle. Although an extensive search was made for excimer emission, no evidence of such emission was found. The production of highly ionized and excited states from materials created by the sputtering of the nozzle has possible applications in VUV spectroscopy. By operating the pulsed jet discharge at a 50 Hz repetition rate with NF$\sb3$ to produce excited fluorine ions, etch rates in excess of 10 $\mu$m/min. have been achieved in silicon, which may have application to micromechanics.68 p.application/pdfengCopyright is held by the author, unless otherwise indicated. Permission to reuse, publish, or reproduce the work beyond the bounds of fair use or other exemptions to copyright law must be obtained from the copyright holder.ElectronicsElectrical engineeringPlasma physicsThesisThesis E.E. 1991 Phillips