Pradhan, N.R.Rhodes, D.Zhang, Q.Talapatra, S.Terrones, M.Ajayan, P.M.Balicas, L.2017-07-312017-07-312013Pradhan, N.R., Rhodes, D., Zhang, Q., et al.. "Intrinsic carrier mobility of multi-layered MoS2 field-effect transistors on SiO2." <i>Applied Physics Letters,</i> 102, no. 12 (2013) American Institute of Physics: http://dx.doi.org/10.1063/1.4799172.https://hdl.handle.net/1911/95627engArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.Intrinsic carrier mobility of multi-layered MoS2 field-effect transistors on SiO2Journal articleIntrinsic_carrier_mobilityhttp://dx.doi.org/10.1063/1.4799172