2016-07-152016-07-152016-05-31Tour, James M., Abramova, Vera and Slesarev, Alexander, "Fabrication of graphene nanoribbons and nanowires using a meniscus as an etch mask." Patent US9356151B2. issued 2016-05-31. Retrieved from <a href="https://hdl.handle.net/1911/90920">https://hdl.handle.net/1911/90920</a>.https://hdl.handle.net/1911/90920In some embodiments, the present disclosure pertains to methods of preparing graphene nanoribbons from a graphene film associated with a meniscus, where the method comprises patterning the graphene film while the meniscus acts as a mask above a region of the graphene film, and where the patterning results in formation of graphene nanoribbons from the meniscus-masked region of the graphene film. Additional embodiments of the present disclosure pertain to methods of preparing wires from a film associated with a meniscus, where the method comprises patterning the film while the meniscus acts as a mask above a region of the film, and where the patterning results in formation of a wire from the meniscus-masked region of the film. Additional embodiments of the present disclosure pertain to chemical methods of preparing wires from water-reactive materials.56engUtility patentUS9356151B2