Tittel, Frank K.Cavallaro, Joseph R.Kido, MotoiSmayling, Michael C.Szabo, GaborWilson, William L.2012-06-212012-06-211994-09-01F. K. Tittel, J. R. Cavallaro, M. Kido, M. C. Smayling, G. Szabo and W. L. Wilson, "Interferometric Phase Shift Technique for High Resolution Deep UV Microlithography," 1994.https://hdl.handle.net/1911/64287A new phase shifting technique based on interferometry has been developed which is especially suited for deep-UV microlithography. Using only a single layer chromium mask, with no additional phase shift elements, significant resolution and contrast enhancement over conventional transmission lithography can be achieved. Both computer simulations, as well as experiments using a CCD camera and UV photoresist confirm the capabilities of this new approach. Using a relatively simple experimental setup and an illumination wavelength of 355 nm, lines with feature sizes as find as 0.3 um were achieved.engPhase shiftMicrolithographyExcimer laserConference paperhttp://dx.doi.org/10.1117/12.204981